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Electron beam-induced deposition

  • 电子束诱导沉积(EBID是一种利用扫描电子显微镜提供的电子束,在衬底上特定位置实现沉积生长的技术。电子束具有极高的空间精准度,可达纳米级别,使得EBID具有生长出独立三维结构的潜能)

网络释义英英释义

短语

Electron beam induced deposition 电子束诱导沉积

Electron beam-induced deposition

  • abstract: Electron beam-induced deposition (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope that results in high spatial accuracy (below one nanometer) and possibility to produce free-standing, three-dimensional structures.

以上来源于: WordNet

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